Array substrate and method of fabricating the same, and liquid crystal display device

ABSTRACT

An array substrate, a method of fabricating the same, and a liquid crystal display device are disclosed. The method comprises: sequentially forming a first transparent conductive material layer, an insulation material layer, a semiconductor material layer and a photoresist layer on a substrate base and forming patterns including a gate line, a gate, a gate insulation layer, a semiconductor layer and a first transparent electrode by patterning process; forming a passivation layer and forming a source via and a drain via connected to the semiconductor layer in the passivation layer; sequentially forming a second transparent conductive material layer and a source-drain metal layer and forming patterns including a source, a drain and a second transparent electrode by patterning process, the gate insulation layer is formed only on the gate and the gate line, the source and the drain include stacked second transparent conductive material layer and source-drain metal layer.

FIELD OF THE INVENTION

The present invention relates to the field of liquid crystal displaytechnology, and more particularly, to an array substrate, a method offabricating the array substrate, and a liquid crystal display device.

BACKGROUND OF THE INVENTION

A liquid crystal display device of ADS mode (Advanced Super DimensionSwitch mode) has advantages of wide viewing angle, high transmittanceand high definition, thus the ADS mode becomes an important mode of theliquid crystal display device.

As shown in FIG. 1, in an array substrate of the ADS mode, a firsttransparent electrode 111 of plate-shape, a gate 21 and a gate line 22of a thin film transistor are provided on a substrate base 9, and a gateinsulation layer 31 covers the first transparent electrode 111, the gate21 and the gate line 22. A semiconductor layer 41 is provided above thegate 21, the semiconductor layer 41, an ohmic contact layer and atransition layer constitute an active region of the thin filmtransistor. A passivation layer 5 and a planarization layer 6sequentially cover the semiconductor layer 41 and the gate insulationlayer 31. A data line Data and a second transparent electrode 121 areprovided on the planarization layer 6. The data line Data and the secondtransparent electrode 121 are electrically connected to a source 71 anda drain 72 of the thin film transistor, respectively. The secondtransparent electrode 121 is a slit-shaped electrode, and is providedabove the first transparent electrode 111. It should be understood that,although a case in which the second transparent electrode 121 is a pixelelectrode and the first transparent electrode 111 is a common electrodeis taken as an example, but if the first transparent electrode 111 isthe pixel electrode (i.e., is electrically connected to the drain 72),the second transparent electrode 121 may be the common electrode.

As shown in FIG. 1, in the array substrate of the ADS mode in prior art,the gate 21, the gate line 22, the semiconductor layer 41, the firsttransparent electrode 111, the source 71, the drain 72 and the secondtransparent electrode 121 are needed to be fabricated in differentpatterning processes, respectively, that is, photolithography isrequired to be performed at least six times so as to fabricate thosestructures. Therefore, the fabricating process is complex.

Meanwhile, the gate insulation layer 31 covers the whole substrate base9, that is, the gate insulation layer 31 is also provided between thefirst transparent electrode 111 and the second transparent electrode121, which increases a distance between the two electrodes and reducesan intensity of electric field and a capacitance, so that driving effectis deteriorated. On the other hand, the gate insulation layer 31 alsoaffects light transmission, so that light transmittance of the arraysubstrate is reduced.

SUMMARY OF THE INVENTION

In order to solve technical problems of complex fabricating process,poor driving effect and low light transmittance of the array substrateof the ADS mode in the prior art, the embodiments of the presentinvention provide an array substrate, a method of fabricating the arraysubstrate, and a liquid crystal display device, which have advantages ofsimple fabricating process, good driving effect and high lighttransmittance.

The embodiments of the present invention provide a method of fabricatingan array substrate, comprising: Step 1 of sequentially forming a firsttransparent conductive material layer, an insulation material layer, asemiconductor material layer and a photoresist layer on a substrate baseand forming patterns including a gate line, a gate, a gate insulationlayer, a semiconductor layer and a first transparent electrode bypatterning process; Step 2 of forming a passivation layer on thesubstrate base and forming a source via and a drain via which areconnected to the semiconductor layer in the passivation layer; and Step3 of sequentially forming a second transparent conductive material layerand a source-drain metal layer on the substrate base and formingpatterns including a source, a drain and a second transparent electrodeby patterning process, wherein the gate insulation layer is formed onlyon the gate and the gate line, the source and the drain are electricallyconnected to the semiconductor layer through the source via and thedrain via, respectively, and the source and the drain include the secondtransparent conductive material layer and the source-drain metal layerwhich are stacked.

The Step 1 may comprise steps of: sequentially forming the firsttransparent conductive material layer, the insulation material layer,the semiconductor material layer and a photoresist layer on thesubstrate base; performing a stepped exposure and a development on thephotoresist layer, so that the photoresist layer with a first thicknessis remained at a region corresponding to the gate, the photoresist layerwith a second thickness is remained at a region corresponding to thegate line, the photoresist layer with a third thickness is remained at aregion corresponding to the first transparent electrode, and nophotoresist layer is remained at other region, the first thickness beinglarger than the second thickness, and the second thickness being largerthan the third thickness; removing the semiconductor material layer, theinsulation material layer and the first transparent conductive materiallayer in the region in which no photoresist layer is remained; removingthe photoresist layer with the third thickness, so that thesemiconductor material layer provided at the region corresponding to thefirst transparent electrode is exposed; removing the semiconductormaterial layer, the insulation material layer provided at the regioncorresponding to the first transparent electrode to form the pattern ofthe first transparent electrode; removing the photoresist layerremaining at the region corresponding to the gate line, so that thesemiconductor material layer provided at the region corresponding to thegate line is exposed; removing the semiconductor material layer providedat the region corresponding to the gate line to form the pattern of thegate line; and removing the remaining photoresist layer to form thepatterns of the gate, the gate insulation layer and the semiconductorlayer.

The Step 3 may comprise steps of: forming the second transparentconductive material layer, the source-drain metal layer and aphotoresist layer on the substrate base; performing a stepped exposureand a development on the photoresist layer, so that the photoresistlayer with a fourth thickness is remained at regions corresponding tothe source and the drain, the photoresist layer with a fifth thicknessis remained at a region corresponding to the second transparentelectrode, and no photoresist layer is remained at other region, thefourth thickness being larger than the fifth thickness; removing thesecond transparent conductive material layer and the source-drain metallayer provided at the region in which no photoresist layer is remained;removing the photoresist layer with the fifth thickness, so that thesource-drain metal layer provided at the region corresponding to thesecond transparent electrode is exposed; removing the source-drain metallayer provided at the region corresponding to the second transparentelectrode to form the pattern of the second transparent electrode; andremoving the remaining photoresist layer to form the patterns of thesource and the drain.

The semiconductor layer may be made of metal oxide semiconductormaterial.

In some embodiments, the first transparent electrode may be a commonelectrode; and the second transparent electrode may be a pixelelectrode, the second transparent electrode and the second transparentconductive material layer of the drain are connected as a whole.

In other embodiments, the first transparent electrode may be a pixelelectrode, and the second transparent electrode may be a commonelectrode; and the Step 2 may further comprise step of forming a viaconnected to the first transparent electrode in the passivation layer,the drain being electrically connected to the first transparentelectrode through the via.

The embodiments of the present invention provide an array substrate,comprising a gate, a gate line, a gate insulation layer, a semiconductorlayer, a first transparent electrode, a second transparent electrode, asource, a drain and a passivation layer, wherein the passivation layercovers the gate line, the gate, the gate insulation layer, thesemiconductor layer and the first transparent electrode; the secondtransparent electrode is provided above the passivation layer; thesource and the drain are provided above the passivation layer and areelectrically connected to the semiconductor layer through a source viaand a drain via provided in the passivation layer, respectively; thegate and the gate line comprise a first transparent conductive materiallayer, the first transparent conductive material layer is provided inthe same layer as the first transparent electrode; the gate insulationlayer is provided only on the gate and the gate line; and the source andthe drain comprise a second transparent conductive material layer and asource-drain metal layer provided on the second transparent conductivematerial layer, the second transparent conductive material layer isprovided in the same layer as the second transparent electrode.

The semiconductor layer may comprise metal oxide semiconductor.

In some embodiments, the second transparent electrode may be a pixelelectrode, the second transparent electrode and the second transparentconductive material layer of the drain are connected as a whole; and thefirst transparent electrode may be a common electrode.

In other embodiments, the first transparent electrode may be a pixelelectrode and is electrically connected to the drain through a viaprovided in the passivation layer; and the second transparent electrodemay be a common electrode.

The embodiments of the present invention provide a liquid crystaldisplay device, comprising the array substrate described above.

The “patterning process” comprises one or more steps of forming a filmlayer, applying photoresist, exposing, developing, etching and strippingoff the photoresist, and portions of the film layer which are not neededmay be removed by the above steps, so that the remaining portion of thefilm layer is formed as a desired pattern.

The “stepped exposure” refers to performing different degrees ofexposure on different positions of a photoresist layer, so that thephotoresist layer after a development has different thicknesses at thedifferent positions, so as to complete subsequent patterning process.

Two structures being provided “in the same layer” means that the twostructures are formed by performing a patterning process on a samecomplete layer, that is, the two structures were a single layerstructure before the patterning process, and it does not mean thatheights of the two structures are equal to each other.

In the method of fabricating the array substrate according to theembodiments of the present invention, the gate line, the gate, the gateinsulation layer, the semiconductor layer and the first transparentelectrode may be formed simultaneously in one patterning process, andthe source, the drain and the second transparent electrode may be formedsimultaneously in one patterning process. Therefore, the process whichrequires six exposures (6 Masks) in the prior art may be changed torequire only two exposures (2 Masks) in the embodiments of the presentinvention, and thus the fabricating process becomes simple. Furthermore,both of the source and the drain are double-layer structure includingmetal layers, and thus have good conductivity. Meanwhile, since the gateinsulation layer of the array substrate is formed only on the gate andthe gate line, there is no gate insulation layer provided between thefirst transparent electrode and the second transparent electrode, sothat the distance between the first transparent electrode and the secondtransparent electrode is short, the intensity of electric field isstrong, the capacitance is large, the driving effect is good, and thegate insulation layer does not have an impact on the light transmission,and thus the light transmittance of the array substrate is high.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a cross-sectional structural view of an array substrate of ADSmode in the prior art.

FIG. 2 is a top view of structures during a process of fabricating anarray substrate according to the embodiments of the present invention.

FIG. 3 is a cross-sectional structural view taken along a line A-A′ ofFIG. 2.

FIG. 4 is a top view of structures during the process of fabricating thearray substrate according to the embodiments of the present invention.

FIG. 5 is a cross-sectional structural view taken along a line A-A′ ofFIG. 4.

FIG. 6 is a top view of structures during the process of fabricating thearray substrate according to the embodiments of the present invention.

FIG. 7 is a cross-sectional structural view taken along a line A-A′ ofFIG. 6.

FIG. 8 is a top view of structures during the process of fabricating thearray substrate according to the embodiments of the present invention.

FIG. 9 is a cross-sectional structural view taken along a line A-A′ ofFIG. 8.

FIG. 10 is a top view of structures during the process of fabricatingthe array substrate according to the embodiments of the presentinvention.

FIG. 11 is a cross-sectional structural view taken along a line A-A′ ofFIG. 10.

FIG. 12 is a top view of structures during the process of fabricatingthe array substrate according to the embodiments of the presentinvention.

FIG. 13 is a cross-sectional structural view taken along a line A-A′ ofFIG. 12.

FIG. 14 is a top view of structures during the process of fabricatingthe array substrate according to the embodiments of the presentinvention.

FIG. 15 is a cross-sectional structural view taken along a line A-A′ ofFIG. 14.

FIG. 16 is a top view of structures during the process of fabricatingthe array substrate according to the embodiments of the presentinvention.

FIG. 17 is a cross-sectional structural view taken along a line A-A′ ofFIG. 16.

FIG. 18 is a top view of structures during the process of fabricatingthe array substrate according to the embodiments of the presentinvention.

FIG. 19 is a cross-sectional structural view taken along a line A-A′ ofFIG. 18.

FIG. 20 is a top view of structures during the process of fabricatingthe array substrate according to the embodiments of the presentinvention.

FIG. 21 is a cross-sectional structural view taken along a line A-A′ ofFIG. 20.

FIG. 22 is a top view of structures during the process of fabricatingthe array substrate according to the embodiments of the presentinvention.

FIG. 23 is a cross-sectional structural view taken along a line A-A′ ofFIG. 22.

FIG. 24 is a top view of structures during the process of fabricatingthe array substrate according to the embodiments of the presentinvention.

FIG. 25 is a cross-sectional structural view taken along a line A-A′ ofFIG. 24.

FIG. 26 is a cross-sectional structural view of an array substrateaccording to other embodiments of the present invention.

DESCRIPTION OF THE PREFERRED EMBODIMENT

Hereinafter, for the person skilled in the art to better understand thetechnical solutions of the present invention, the present invention willbe described in detail with reference to the accompanying drawings andthe exemplary embodiments.

First Embodiment

This embodiment provides a method of fabricating an array substrate, themethod comprises following steps 1 through 3.

In the step 1, a first transparent conductive material layer, aninsulation material layer, a semiconductor material layer and aphotoresist layer are sequentially formed on a substrate base, andpatterns including a gate line, a gate, a gate insulation layer, asemiconductor layer and a first transparent electrode are formed bypatterning process, the gate insulation layer is formed only on the gateand the gate line.

In the step 2, a passivation layer is formed on the substrate base, anda source via and a drain via which are connected to the semiconductorlayer are formed in the passivation layer.

In the step 3, a second transparent conductive material layer and asource-drain metal layer are sequentially formed on the substrate base,and patterns including a source, a drain and a second transparentelectrode are formed by patterning process, the source and the drain areelectrically connected to the semiconductor layer through the source viaand the drain via, respectively, and the source and the drain includethe second transparent conductive material layer and the source-drainmetal layer which are stacked.

In the method of fabricating the array substrate according to theembodiment, the gate line, the gate, the gate insulation layer, thesemiconductor layer and the first transparent electrode may be formedsimultaneously in one patterning process, and the source, the drain andthe second transparent electrode may be formed simultaneously in onepatterning process. Therefore, the process which requires six exposures(6 Masks) in the prior art may be changed to require only two exposures(2 Masks) in the embodiment, and thus the fabricating process becomessimple. Furthermore, both of the source and the drain are double-layerstructure including metal layers, and thus have good conductivity.Meanwhile, since the gate insulation layer of the array substrate isformed only on the gate and the gate line, there is no gate insulationlayer provided between the first transparent electrode and the secondtransparent electrode, so that the distance between the firsttransparent electrode and the second transparent electrode is short, theintensity of electric field is strong, the capacitance is large, thedriving effect is good, and the gate insulation layer does not have animpact on the light transmission, and thus the light transmittance ishigh.

Specifically, as shown in FIGS. 2 through 25, the method of fabricatingthe array substrate according to the embodiment comprises followingsteps S101 through S116.

In the step S101, a first transparent conductive material layer 11, aninsulation material layer 3 and a semiconductor material layer 4 aresequentially formed on a substrate base 9, and a photoresist layer 8 isapplied on the semiconductor material layer 4.

In this step, a gate metal layer 2 may be further formed between thefirst transparent conductive material layer 11 and the insulationmaterial layer 3.

The first transparent conductive material layer 11 is made of materialwhich is transparent and electrically conductive, such as indium tinoxide (ITO), and is used for forming a first transparent electrode 111,a gate 21 and a gate line 22.

The gate metal layer 2 is generally made of metal such as molybdenum oraluminum or alloy and is mainly used for forming the gate 21 and thegate line 22 together with the first transparent conductive materiallayer 11, thereby improving electrical conductivity of the gate 21 andthe gate line 22.

It should be understood that, since the first transparent conductivematerial layer 11 is formed, the gate metal layer 2 may not be formedand the gate 21 and the gate line 22 may be formed by using only thefirst transparent conductive material layer 11. If the gate metal layer2 is not formed in this step, operation of removing the metal gate layer2 in subsequent steps will not be performed accordingly.

The insulation material layer 3 may be made of silicon nitride orsilicon oxide and is mainly used for forming a gate insulation layer 31,so that the gate 21 is insulated from the semiconductor layer 41 and amotion interface of carriers is formed.

The semiconductor material layer 4 is made of semiconductor material andis mainly used for forming a semiconductor layer 41. For example, thesemiconductor layer 41 (or the semiconductor material layer 4) is madeof metal oxide semiconductor, such as indium gallium zinc oxide (IGZO),indium tin zinc oxide (ITZO) or zinc oxide (ZnO). Alternatively, thesemiconductor layer 41 may be made of other semiconductor material suchas poly-silicon or amorphous silicon.

In this step, the well-known structure such as buffer layer may beformed on the substrate base 9 in advance. Respective layers may be madeof other well-known material. The method of forming the respectivelayers may be a well-known process such as sputtering, evaporation,chemical vapor deposition or coating. Since the above material, processand parameters for forming the respective layers are well known, thedetailed description thereto will be omitted in the embodiment.

In the step S102, as shown in FIGS. 2 and 3, a stepped exposure and adevelopment are performed on the photoresist layer 8, so that thephotoresist layer 8 with a first thickness is remained at a gateposition Q1 (a region corresponding to the gate), the photoresist layer8 with a second thickness is remained at a gate line position Q2 (aregion corresponding to the gate line), the photoresist layer 8 with athird thickness is remained at a first transparent electrode position Q3(a region corresponding to the first transparent electrode), and nophotoresist layer 8 is remained at other position Q4, the firstthickness is larger than the second thickness, and the second thicknessis larger than the third thickness.

That is, different degrees of exposure is performed on differentpositions of the photoresist layer 8, so that the photoresist layer 8subjected to the development includes three portions with differentthicknesses, and no photoresist layer 8 is remained at parts of theregion above the semiconductor material layer 4, as shown in FIG. 3.

For example, the stepped exposure may be performed by using a gray scalemask or a halftone mask.

In the step S103, the semiconductor material layer 4, the insulationmaterial layer 3, the gate metal layer 2 and the first transparentconductive material layer 11 in the region in which no photoresist layeris remained are removed, and structures shown in FIGS. 4 and 5 areobtained.

That is, the semiconductor material layer 4, the insulation materiallayer 3, the gate metal layer 2 and the first transparent conductivematerial layer 11 provided at the region Q4 in which no photoresistlayer is remained are removed sequentially by etching, so that the firsttransparent conductive material layer 11 of the first transparentelectrode region Q1 is separated from the first transparent conductivematerial layer 11 in other regions.

In this step, the etching may be performed by well-known methods, theplurality of the layers may be removed simultaneously in one etchingprocess, or only one layer may be removed in each etching process,depending on the material of the layers and the etching process. Sincethe etching process and the parameters are well known, the detaileddescription thereto will be omitted in the embodiment.

In the step S104, the photoresist layer 8 with the third thickness isremoved, so that the semiconductor material layer 4 at the firsttransparent electrode position Q3 is exposed, and structures shown inFIGS. 6 and 7 are obtained.

That is, the photoresist layer 8 with the third thickness is removed byashing process, so that the photoresist layer 8 at the first transparentelectrode position Q3 is completely removed, the semiconductor materiallayer 4 at the first transparent electrode position Q3 is exposed, whilethe photoresist layer 8 at the gate position Q1 and the gate lineposition Q2 is only thinned accordingly, resulting in the structuresshown in FIGS. 6 and 7.

In this step, areas of the photoresist layer 8 at the gate position Q1and the gate line position Q2 are actually slightly reduced due to thecharacteristic of ashing process, but it does not have any substantialimpact on the structure of final product, and thus it is not shown inthe drawings.

In the step S105, the semiconductor material layer 4, the insulationmaterial layer 3 and the gate metal layer 2 provided at the firsttransparent electrode position Q3 are removed to form the pattern of thefirst transparent electrode 111 (plate-shape electrode), as shown inFIGS. 8 and 9.

In this step, since the photoresist layer 8 at the first transparentelectrode position Q3 has been already removed, the semiconductormaterial layer 4, the insulation material layer 3 and the gate metallayer 2 provided at the first transparent electrode position Q3 may besequentially removed by etching process, so that the first transparentconductive material layer 11 is exposed, thereby forming the firsttransparent electrode 111.

In the step S106, the photoresist layer 8 remaining at the gate lineposition Q2 is removed, so that the semiconductor material layer 4 atthe gate line position Q2 is exposed, resulting in the structures shownin FIGS. 10 and 11.

That is, the photoresist layer 8 remaining at the gate line position Q2(the thickness of which may be equal to the second thickness minus thethird thickness) is removed by ashing process, so that the semiconductormaterial layer 4 at the gate line position Q2 is exposed, while thephotoresist layer 8 at the gate position Q1 is further reduced,resulting in the structures shown in FIGS. 10 and 11.

In the step S107, the semiconductor material layer 4 at the gate lineposition Q2 is removed and the insulation material layer 3 at the gateline position Q2 is also removed to form the pattern of the gate line22, resulting in the structures shown in FIGS. 12 and 13.

That is, the semiconductor material layer 4 and the insulation materiallayer 3 at the gate line position Q2 are sequentially removed by etchingprocess, so that the gate metal layer 2 is exposed, thereby forming thepattern of the gate line 22.

In this step, the insulation material layer 3 at the gate line positionQ2 is also removed, so that the gate insulation layer 31 is not providedon the gate line 22 in the final product, the pattern of the gateinsulation layer 31 coincides with the pattern of the semiconductorlayer 41, and both of the gate insulation layer 31 and the semiconductorlayer 41 are provided only on the gate 21. The advantage of this processis that the semiconductor material layer 4 and the insulation materiallayer 3 may be removed by using a certain etchant in one etchingprocess, thereby simplifying the process.

It should be understood that, in this step, only the semiconductormaterial layer 4 at the gate line position Q2 may be removed, while theinsulation material layer 3 is remained. Thus, in the final product, thegate insulation layer 31 is still provided on the gate line 22 (but thesemiconductor layer 41 is provided only on the gate 21), the gateinsulation layer 31 may increase the distance between the gate line 22and the data line, thereby reducing the coupling capacitance between thegate line 22 and the data line.

In this step, the example in which the array substrate comprises thegate metal layer 2 is described in the embodiment, that is, the gateline 22 consists of the gate metal layer 2 and the first transparentconductive material layer 11, thereby improving the electricalconductivity of the gate line 22. It should be understood that, if thegate metal layer 2 is not formed in the step S101, only the firsttransparent conductive material layer 11 is remained at the gate lineposition Q2 in this case, that is, the gate line 22 may only consist ofthe transparent conductive material.

Meanwhile, in the embodiment, other structure such as a common electrodeline may also be formed, and detailed description thereto will beomitted herein.

In the step S108, all remaining photoresist layer 8 is removed to formthe patterns of the gate 21, the gate insulation layer 31 and thesemiconductor layer 41, as shown in FIGS. 14 and 15.

That is, all remaining photoresist layer 8 (i.e., the photoresist layer8 at the gate position Q1) is removed, so that the semiconductormaterial layer 4 is exposed, thereby forming the gate 21, the gateinsulation layer 31 and the semiconductor layer 41.

As can be seen from the above, the patterns of the gate line 22, thegate 21, the gate insulation layer 31, the semiconductor layer 41 andthe first transparent electrode 111 may be formed by only one exposurein the embodiment, and thus the number of exposures to be performed issignificantly reduced and the fabricating process becomes simple.

Meanwhile, in the array substrate of the embodiment, the gate insulationlayer 31 is formed only on the gate 21 and the gate line 22, that is,the gate insulation layer 31 is not provided between the firsttransparent electrode 111 and the second transparent electrode 121.Therefore, the distance between the first transparent electrode 111 andthe second transparent electrode 121 is short, the intensity of electricfield is strong, the capacitance is large, the driving effect is good,and the gate insulation layer 31 does not have an impact on the lighttransmission, and thus the light transmittance is high.

In the step S109, a passivation layer (PVX) 5 is formed, and a sourcevia and a drain via connected to the semiconductor layer 41 are formedin the passivation layer 5.

The passivation layer 5 may be made of material such as silicon nitrideor silicon oxide and is used for protecting the semiconductor layer 41,and the passivation layer 5 makes the first transparent electrode 111 tobe separated from other structures provided above the passivation layer5.

In the step S110, a second transparent conductive material layer 12, asource-drain metal layer 7 and a photoresist layer 8 are sequentiallyformed.

The second transparent conductive material layer 1 may be made of thesame material as that of the first transparent conductive material layer11, and the source-drain metal layer 7 may be made of the same materialas that of the gate metal layer 2.

In the step S111, a stepped exposure and a development are performed onthe photoresist layer 8, so that the photoresist layer with a fourththickness is remained at a source position and a drain position (regionscorresponding to the source and the drain), the photoresist layer with afifth thickness is remained at a second transparent electrode position(a region corresponding to the second transparent electrode), and nophotoresist layer is remained at other positions, the fourth thicknessis larger than the fifth thickness.

That is, the photoresist layer 8 is stepped exposed by using a grayscale mask or a halftone mask and then is developed, so that thephotoresist layer 8 with a larger thickness is remained at the positionscorresponding to the source and the drain, the photoresist layer 8 witha smaller thickness is remained at the position corresponding to thesecond transparent electrode 121, and no photoresist layer is remainedat other positions, resulting in the structures shown in FIGS. 16 and17.

It should be understood that, since the data line Data is connected tothe source 71, the data line Data may be formed together with the source71. If the data line Data is going to be formed, the photoresist layerwith the larger thickness is also required to be remained at a positioncorresponding to the data line Data (i.e., the pattern of the sourceincludes a portion of the data line Data).

In the step S112, the second transparent conductive material layer 12and the source-drain metal layer 7 at the region in which no thephotoresist layer is remained are removed.

That is, the exposed second transparent conductive material layer 12 andsource-drain metal layer 7 are removed by etching, resulting in thestructures shown in FIGS. 18 and 19.

In the step S113, the photoresist layer 8 with the fifth thickness isremoved, so that the source-drain metal layer 7 at the secondtransparent electrode position is exposed.

That is, the photoresist layer 8 at the second transparent electrodeposition is removed by ashing process, so that the source-drain metallayer 7 provided at the position is exposed, while the photoresist layer8 at the positions corresponding to the source and the drain is thinned,resulting in the structures shown in FIGS. 20 and 21.

In the step S114, the source-drain metal layer 7 at the secondtransparent electrode position is removed to form the pattern of thesecond transparent electrode 121.

That is, the exposed source-drain metal layer 7 is removed, so that theremaining second transparent conductive material layer 12 is formed asthe second transparent electrode 121, resulting in the structures shownin FIGS. 22 and 23. The second transparent electrode 121 is providedabove the first transparent electrode 111 and is a slit-shapedelectrode, thereby constituting the array substrate of ADS mode.

The second transparent electrode 121 and the second transparentconductive material layer of the drain 72 are connected as a whole, thatis, the pattern of the second transparent electrode 121 and the patternof the second transparent conductive material layer of the drain areformed integrally, and the two patterns are not disconnected from eachother. Therefore, the second transparent electrode 121 is the pixelelectrode, and accordingly, the first transparent electrode 111 is thecommon electrode.

In the step S115, the remaining photoresist layer 8 is removed to formthe patterns of the source 71 and the drain 72.

That is, the remaining photoresist layer 8 at the positionscorresponding to the source 71 and the drain 72 is removed, so that theremaining second transparent conductive material layer 12 andsource-drain metal layer 7 provided at the positions are formed as thesource 71 and the drain 72 (while the data line Data may also beformed), resulting in the array substrates shown in FIGS. 24 and 25.

In the embodiment, the source 71, the drain 72 and the secondtransparent electrode 121 may be formed by one photolithographicprocess, so that the fabricating process is simple. Meanwhile, both ofthe source 71 and the drain 72 consist of the second transparentconductive material layer 12 and the source-drain metal layer 7 whichare stacked. Since the electrical conductivity of the source-drain metallayer 7 is good, the electrical conductivity of the source 71 and thedrain 72 is also good.

In the step S116, other well-known structures (not illustrated in thedrawings) such as alignment film are further formed to completefabrication of the array substrate.

In the embodiment, an example in which the first transparent electrode111 is the common electrode and the second transparent electrode 121 isthe pixel electrode is described. It should be understood that, asanother aspect of the embodiments of the present invention, the firsttransparent electrode 111 may be the pixel electrode, and the secondtransparent electrode 121 may be the common electrode. In this case, thestructures of the array substrate are shown in FIG. 26, the drain 72(i.e., the second transparent conductive material layer 12 of the drain72) is connected to the first transparent electrode 111 through a viaprovided in the passivation layer 5, while the pattern of the secondtransparent electrode 121 is disconnected from the second transparentconductive material layer 12 of the drain 72. When fabricating this kindof array substrate, a via for connecting the drain 72 with the firsttransparent electrode 111 is required to be formed in the passivationlayer 5, and the pattern of the second transparent electrode 121 isrequired to be changed.

It should be understood that the array substrate in the above embodimentmay be modified in several manners.

For example, a planarization layer may be further formed after formingthe source and the drain, the planarization layer may be made ofmaterial such as resin and is mainly used for offsetting heightdifferences generated due to structures such as the thin filmtransistor, so that the overall surface of the array substrate is almostflat, so as to uniformly form the film layer of the alignment film insubsequent process, and facilitate uniform rubbing of rubbing-alignmentprocess.

Alternatively, the planarization layer may be formed immediately afterforming the passivation layer, so that the source, the drain and thesecond transparent electrode may be formed on the planarization layer.

Furthermore, the data line and the common electrode line may be formedin other steps.

Second Embodiment

As shown in FIGS. 25 and 26, this embodiment provides an array substratefabricated by the method described above, comprising a gate 21, a gateline 22, a gate insulation layer 31, a semiconductor layer 41, a firsttransparent electrode 111, a second transparent electrode 121, a source71, a drain 72, and a passivation layer 5.

The passivation layer 5 covers the gate line 22, the gate 21, the gateinsulation layer 31, the semiconductor layer 41 and the firsttransparent electrode 111.

The second transparent electrode 121 is provided above the passivationlayer 5.

The source 71 and the drain 72 are provided above the passivation layer5 and are electrically connected to the semiconductor layer 41 through asource via and a drain via provided in the passivation layer 5,respectively.

The gate 21 and the gate line 22 comprise a first transparent conductivematerial layer 11, the first transparent conductive material layer 11 isprovided in the same layer as the first transparent electrode 111.

The gate insulation layer 31 is provided only on the gate 21 and thegate line 22.

The source 71 and the drain 72 comprise a second transparent conductivematerial layer 12 and a source-drain metal layer 7 provided on thesecond transparent conductive material layer 12, the second transparentconductive material layer 12 is provided in the same layer as the secondtransparent electrode 121.

The semiconductor layer 41 may be made of metal oxide semiconductor.

The second transparent electrode 121 may be a pixel electrode, thesecond transparent electrode 121 and the second transparent conductivematerial layer 12 of the drain 72 are connected as a whole, and thefirst transparent electrode 111 may be a common electrode.

Alternatively, the first transparent electrode 111 may be the pixelelectrode and is electrically connected to the drain 72 through a viaprovided in the passivation layer, and the second transparent electrode121 may be the common electrode.

The array substrate of the embodiment may further comprise otherwell-known structures such as a common electrode line, a data line andan alignment film, and the detailed description thereto is omittedherein.

Third Embodiment

This embodiment provides a liquid crystal display device comprising thearray substrate described above. The liquid crystal display device maybe applicable to liquid crystal display panels, electronic papers, cellphones, tablet computers, TV, displays, laptops, digital photo frames,navigation systems and any other product or component that has a displayfunction.

The liquid crystal display device of the embodiment comprises the arraysubstrate described above, and has advantages of simple fabricatingmethod, good driving effect and high light transmittance.

It should be appreciated that the above embodiments are only theexemplary embodiments employed for illustrating the principle of thepresent invention, but the present invention is not limited thereto. Itwill be apparent to those skilled in the art that modifications andvariations can be made without departing from the spirit and scope ofthe present invention, and these modifications and variations are alsoconsidered to fall within the scope of protection of the presentinvention.

1. An array substrate, comprising a gate, a gate line, a gate insulationlayer, a semiconductor layer, a first transparent electrode, a secondtransparent electrode, a source, a drain and a passivation layer,wherein the passivation layer covers the gate line, the gate, the gateinsulation layer, the semiconductor layer and the first transparentelectrode; the second transparent electrode is provided above thepassivation layer; the source and the drain are provided above thepassivation layer and are electrically connected to the semiconductorlayer through a source via and a drain via provided in the passivationlayer, respectively; the gate and the gate line comprise a firsttransparent conductive material layer, the first transparent conductivematerial layer is provided in the same layer as the first transparentelectrode; the gate insulation layer is provided between the gate andthe semiconductor layer and is not provided between the firsttransparent electrode and the second transparent electrode; and thesource and the drain comprise a second transparent conductive materiallayer and a source-drain metal layer provided on the second transparentconductive material layer, the second transparent conductive materiallayer is provided in the same layer as the second transparent electrode.2. The array substrate of claim 1, wherein the semiconductor layercomprises metal oxide semiconductor.
 3. The array substrate of claim 1,wherein the second transparent electrode is a pixel electrode, thesecond transparent electrode and the second transparent conductivematerial layer of the drain are connected as a whole; and the firsttransparent electrode is a common electrode.
 4. The array substrate ofclaim 1, wherein the first transparent electrode is a pixel electrodeand is electrically connected to the drain through a via provided in thepassivation layer; and the second transparent electrode is a commonelectrode.
 5. The array substrate of claim 1, wherein a pattern of thegate insulation layer coincides with a pattern of the semiconductorlayer.
 6. The array substrate of claim 5, wherein both of the gateinsulation layer and the semiconductor layer are provided only on thegate.
 7. The array substrate of claim 1, wherein the gate insulationlayer is further provided on the gate line.
 8. The array substrate ofclaim 1, wherein the gate and the gate line further comprise a gatemetal layer provided between the first transparent conductive materiallayer and the gate insulation layer.
 9. The array substrate of claim 8,wherein a pattern of the gate metal layer coincides with a pattern ofthe first transparent conductive material layer.
 10. The array substrateof claim 1, wherein an edge of the gate, an edge of the gate insulationlayer and an edge of the semiconductor layer are aligned with eachother.
 11. A liquid crystal display device, comprising an arraysubstrate, the array substrate comprising a gate, a gate line, a gateinsulation layer, a semiconductor layer, a first transparent electrode,a second transparent electrode, a source, a drain and a passivationlayer, wherein the passivation layer covers the gate line, the gate, thegate insulation layer, the semiconductor layer and the first transparentelectrode; the second transparent electrode is provided above thepassivation layer; the source and the drain are provided above thepassivation layer and are electrically connected to the semiconductorlayer through a source via and a drain via provided in the passivationlayer, respectively; the gate and the gate line comprise a firsttransparent conductive material layer, the first transparent conductivematerial layer is provided in the same layer as the first transparentelectrode; the gate insulation layer is provided between the gate andthe semiconductor layer and is not provided between the firsttransparent electrode and the second transparent electrode; and thesource and the drain comprise a second transparent conductive materiallayer and a source-drain metal layer provided on the second transparentconductive material layer, the second transparent conductive materiallayer is provided in the same layer as the second transparent electrode.12. The liquid crystal display device of claim 11, wherein thesemiconductor layer comprises metal oxide semiconductor.
 13. The liquidcrystal display device of claim 11, wherein the second transparentelectrode is a pixel electrode, the second transparent electrode and thesecond transparent conductive material layer of the drain are connectedas a whole; and the first transparent electrode is a common electrode.14. The liquid crystal display device of claim 11, wherein the firsttransparent electrode is a pixel electrode and is electrically connectedto the drain through a via provided in the passivation layer; and thesecond transparent electrode is a common electrode.
 15. The liquidcrystal display device of claim 11, wherein a pattern of the gateinsulation layer coincides with a pattern of the semiconductor layer.16. The liquid crystal display device of claim 15, wherein both of thegate insulation layer and the semiconductor layer are provided only onthe gate.
 17. The liquid crystal display device of claim 11, wherein thegate insulation layer is further provided on the gate line.
 18. Theliquid crystal display device of claim 11, wherein the gate and the gateline further comprise a gate metal layer provided between the firsttransparent conductive material layer and the gate insulation layer. 19.The liquid crystal display device of claim 18, wherein a pattern of thegate metal layer coincides with a pattern of the first transparentconductive material layer.
 20. The liquid crystal display device ofclaim 11, wherein an edge of the gate, an edge of the gate insulationlayer and an edge of the semiconductor layer are aligned with eachother.